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GaN Process (°æ·Â)
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[´ã´ç¾÷¹«] GaN¹°Áú ±â¹Ý power device Çâ Fab process °³¹ß ¹× Æò°¡ - ´ë¸éÀû(8") GaN fab process °³¹ß (½Å±Ô °øÁ¤ °³¹ß Æ÷ÇÔ) - ´ë¸éÀû(8") GaN fab process °ü¸® ¹× PI(¾ç»ê) ´ëÀÀ [±Ù¹«ºÎ¼ ¹× Á÷±Þ/Á÷Ã¥]
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[ÀÚ°Ý¿ä°Ç] - ÇзÂ: ÇлçÀÌ»ó - °æ·Â: 3³âÀÌ»ó - Si or GaN Unit process ¹× process integration °æÇè - Process ¿Í device performance ¿¬°ü¼º Æò°¡ °æÇè - Si(¡Ã8") Etch process °æÇè
[¿ì´ë»çÇ×] - GaN epi ±¸Á¶ ¹× device operation ÀÌÇØ - GaN unit process set up ¹× process integration - 100~650V GaN discrete ¹× IC mask Á¦ÀÛ°æÇè - GaN process¿Í device performance ¿¬°ü¼º Æò°¡ °æÇè
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